|
|
|
12" POROMERIC POLISHING PAD ( PSA)Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. It is excellent for the applications, such as
Final polishing of LiNbO3 and Sapphire wafers
Final polishing in CMP for semiconductors and oxide crystals.
EPI polishing for all single crystal substrates.
Final polishing for metallographic sample
PSA backing , fit with any 12" polishing machine
|
|
|
|
|
|
|
|
