KSL-1600X-A2 Larger Bench-Top High T...

 
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KSL-1600X-A2 Larger Bench-Top High Temperature Muffle Furnace, 8 x 8 x 8" up to 1600C

Your Price: $7,995.00

at Advanced Crystals & Processing Equipment

KSL-1600X-A2 Larger Bench-Top High Temperature Muffle Furnace, 8 x 8 x 8" up to 1600C
KSL-1600X-A2 Larger Bench-Top High Temperature Muffle Furnace, 8 x 8 x 8" up to 1600C























Main Specifications
KSL-1600X-A2 is the most cost effective bench-top high temperature muffle furnace made by MTI. The furnace consists of high quality alumina fiber brick and MoSi2 heating elements with chamber of 8"x8"x8", and temperature is controlled by high precision SCR ( Silicon Controlled Rectifier) digital controller with accuracy +/-1 deg oC and 51 segments programmable up to 1600 oC or 2912 F. It is an ideal tool for materials annealing and sintering in your research laboratory..



Inside Chamber Size

200 x 200x 200 mm (8 x 8 x 8 inch), 8.0 Liter


Standard Working Temperature

1550 oC ( continuous )


Maximum Working Temperature

1600 oC (


Temperature Control



PID automatic control via SCR ( Silicon Controlled Rectifier) power control, e.g. current limiting phase angle fired the resistor with 51 steps programmable

Please clcik here to learn why SCR is more accurate than SSC ( Solid
state relay)


Heating Rate

0~20 oC / min (suggestion: =oC)


Temperature Accuracy

+/- 1 oC


Heating Element

MoSi2


Working Voltage

AC 220V single Phase


Max. Power

9 KW ( require > 63Amp air breaker)

Max. Current
up to 45 A


Outside Size

550 x 540 x 820mm


Net Weight

135 Kg (286 lbs)


Limited Warranty

One year manufacture limited warranty and free replace all defective parts (not including spare parts).

Shipping dimension
34" x 32" x 53"

Shipping weight
360 Lbs
Standard Package





N0.

Name

Unit

Amount

Note


1

KSL-1600X-A2 high temperature furnace

each

1




2

MoSi2 heating elements

each

6




3

Double platinum-rhodium thermocouples (B type)

pair

1




4

Al2O3 sample plate

each

1




5

Al2O3 door block

each

1




6

Protection glove

pair

1




7

Manual

each

1

View product maual


8

Crucible pliers

pair

1


View operation manual Download Catalog flyer About shipping and handling
Warning:
MoSi2 heating element is used in the high temperature under oxidizing atmosphere. It will form the SiO2 film which can keep the element from being melted. During the oxidizing process, the SiO2 protecting film is formed again when the element continues to be used. The MoSi2 heating element must not be used in the temperature between 400 oC and 700 oC for a long time, otherwise the element will be cremated under the strong oxidizing function in the low temperature.























Please
click

here to learn how to DIY gas purging system






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Home > General Merchandise > Miscellaneous > Advanced Crystals & Processing Equipment > Heating and Sintering Solution > KSL-1600X-A2 Larger Bench-Top High Temperature Muffle Furnace, 8 x 8 x 8" up to 1600C