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Three 3" POROMERIC POLISHING PAD ( PSB)Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. It is excellent for the applications, such as
Final polishing of LiNbO3 and Sapphire samples
Final polishing in CMP for semiconductors and oxide crystals.
EPI polishing for all single crystal substrates.
The 3" pad is designed for final polishing at Unipol 300 mini polisher
The standard sizes of poromeric polishing pad are 3", 8", and 15". However, custom size is available upon request up to 640 mm x 1400 mm with thickness between 0.5 mm and 4 mm
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