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15" POROMERIC POLISHING PAD ( PSB)Poromeric pad is made of napped none-woven materials with uniform pore structure and wall strength. It is excellent for the applications, such as:
Polishing of LiNbO3 and sapphire wafers
Polishing in CMP for semiconductors and oxide crystals.
EPI polishing for all single crystal substrates.
The standard sizes of poromeric polishing pad are 8"and 15". However, custom size is available upon request up to 640 mm x 1400 mm with thickness between 0.5 mm and 4 mm
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